|
|
 |
 |
CONTRACT OPPORTUNITIES ADITIONAL INFORMATION
|
Project reference: 2009-108369
Title: CONTRACT NOTICE FOR THE SUPPLY OF SCIENTIFIC MATERIAL AND INSTRUMENTS
Complementary information: MINUTES OF THE MEETING OF THE SELECTION COMMITTEE OF THE PUBLIC CEREMONY FOR THE OPENINING OF ENVELOPE A OF EACH TENDERER
Date of dispatch : 17-12-2009
Additional information:
MINUTES OF THE MEETING OF THE SELECTION COMMITTEE OF THE INTERNATIONAL IBERIAN NANOTECHNOLOGY LABORATORY IN CHARGE OF PROPOSING THE AWARD OF THE CONTRACT FOR THE SUPPLY OF SCIENTIFIC MATERIALS AND INSTRUMENTS TO THE INTERNATIONAL IBERIAN NANOTECHNOLOGY LABORATORY
Attendees:
Mr. José Rivas, Director General of the INL, as President.
Mr. Paulo Jorge Peixeiro Freitas, Deputy Director-General of the INL, as Vice-President.
Mr. Alejandro Pan, as Secretary.
In Braga, on 30th November 2009, being 10:45 am, at the INL’s offices, located at Avenida Central 100, Edificio dos Congregados, Braga, the ‘Selection Committee of the International Iberian Nanotechnology Laboratory in charge of proposing the award of the contract for the supply of scientific material and instruments’ (hereinafter SELECTION COMMITTEE), being present the aforementioned attendees, celebrates a PUBLIC CEREMONY for the opening of envelope A of each tenderer.
During the public ceremony, the Selection Committee has announced the result of the assessment of the documentation submitted, indicating that the following tenderers have been accepted:
1. NANOBEAM LIMITED
2. ACCURION GMBH
3. EUROPE GMBH
4. QUIMIPOL J. BLANCH FERRER, S.L.
5. OXFORD INSTRUMENTS
6. VISTEC LITHOGRAPHY B.V.
7. MAGNETIC SOLUTIONS LIMITED
8. AIXTROM LIMITED
9. ENGN TECHNOLOGIES-SOLUÇOES DE MEDIDA DE TELECOMUNICAÇOES, LDA.
10. SINGULUS TECHNOLOGIES AG
11. NORDIKO
12. HEIDELBERG INSTRUMENTS
13. KUMMER
14. ACCRETECH (EUROPE) GMBH
15. TELSTAR INSTRUMAT, S.L.
16. AJA INTERNATIONAL, INC.
17. DKSH FRANCE, S.A.
18. CAPRES A/S
19. TSE-SYSTEME GMBH
20. LOT – ORIEL LASER OPTIK TECHNOLOGIE GMBH & CO. KG.
21. SCIENTEC S.A.R.L.
22. SUSS MICROTECH LITOGRAPHY GMBH
23. 4WAVE INC.
24. KENOSISTEC SRL
25. TFE SRL THIN FILM EQUIPMENT
26. CRESTEC CORPORATION
27. INNODYS SL
28. EQUIPAMENTOS INDUSTRIAIS E DE LABORATORIO, S.A.
29. EVATEC THINFILM TECHONOLOGY GMBH
30. SURFACE TECHNOLOGY SYSTEMS, PLC.
31. 4WAVE INC.
32. EVGROUP EUROPE AND ASIA/PACIFIC GMBH
33. JEOL (EUROPE) SAS
34. DIAS DE SOUSA INSTRUMENTAÇAO ANALÍTICA E CIENTÍFICA, S.A.
35. SMARTIP B.V.
Otherwise, the following tenderers have been excluded:
1. FELCON LTD, due to this company has not remedy or cure the remediable material defect that were observed by the Selection Committee during the three business days that the tenderer was afforded.
2. LAY CONCEPT, due to this company has only sent one envelope.
Following, the Selection Committee has opened envelope A, reading in loud the economic proposal of the different tenderers, which are specified below:
1. NANOBEAM LIMITED
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.1 E-beam lithography system 1.300.000 € 8 months NO
2. ACCURION GMBH
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
4.3 Spestroscopic Imaging Ellipsometer 169.800€ 4 months NO
3. EUROPE GMBH
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.4 Dual resist and developer coating tracks (optical photoresist) 204.500€ 10 weeks NO
1.5 Dual resist and developer coating tracks (e-beam resist, PMMA) 196.900€ 10 weeks NO
1.6 BenchTop Semi-automatic Photoresist and Developer Coating/Baking Systems 46.440€ 4-6 weeks no
4. QUIMIPOL J. BLANCH FERRER, S.L.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
2.1 Wetbench for organic solvents (resist stripping process) 48.000€ 3 months Yes
2.2 Wetbench for contaminated solvents (lift-off process) 48.000€ 3 months Yes
2.3 Wetbench for contaminated aqueous chemicals (wet metal etching process) 50.000€ 3 months yes
2.4 Wetbench for aqueous chemicals (SIOX etching process) 46.750 € 3 months yes
2.5 Fume-hood for Cu-electrodeposition 9.500 € 3 months Yes
2.6 Fume-hood for organic solvents 8.500€ 3 months Yes.
2.7 Fume-hood for contaminated aqueous chemicals 9.100€ 3 months Yes
2.8 Fume-hood for aqueous chemicals 9.300 € 3 months yes
5. OXFORD INSTRUMENTS
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.2. Plasma-Enhanced Chemical Vapor Deposition Tool for SIO2 OR SINX 272.425 € 16-20 weeks -----
3.2 Plasma-Enhanced Chemical Vapor Deposition Tool for SIO2 OR SINX 189.667 € 16-20 weeks -----
3.3 Physical Vapor Deposition Tool for metallization and passivation 977.221 € 24 weeks -----
3.4 Reactive Ion Etching System for SIO2 or SINX 244.340 € 16-20 weeks -----
3.5 Reactive Ion System for AISiCu and TiN 289.355 € 16-20 weeks -----
3.5 Reactive Ion System for AISiCu and TiN 440.706 € 16-20 weeks -----
3.6 Ion Milling System 589.490 € 24 weeks -----
3.8 Deep Si-Etching System 321.776 € 16-20 weeks -----
3.9 Chemical Vapor Deposition for Carbon Nanotubes and Nanowires 229.816 € 16-20 weeks -----
6. VISTEC LITHOGRAPHY B.V.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.1 E-beam lithography system 1.695.000 € 10 months NO
7. MAGNETIC SOLUTIONS LIMITED
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
5.3 Magnetic Annealing Set-up 345.000 € 2 weeks Yes
5.3 Magnetic Annealing Set-up 275.000 € 2 weeks yes
8. AIXTROM LIMITED
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.9 Chemical Vapor Deposition for Carbon Nanotubes and Nanowires 227.500 € 6 months
9. ENGN TECHNOLOGIES-SOLUÇOES DE MEDIDA DE TELECOMUNICAÇOES, LDA.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
4.1 Programmable Wafer Tester 89.883,46 € 11 weeks
10. SINGULUS TECHNOLOGIES AG
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.1 Multi-target physical vapor deposition cluster tool 2.700.000 € 8 months NO
3.1 Multi-target physical vapor deposition cluster tool) 2.300.000 € 5 months NO
3.3. Physical Vapor Deposition Tool for metallization and passivation 1.000.000 € 8 months no
3.3 Physical Vapor Deposition Tool for metallization and passivation 700.000 € 8 months no
11. NORDIKO
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.6 Ion Milling System 599.950 € 30 weeks yes
12. HEIDELBERG INSTRUMENTS
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.2 Laser Direct Write Lithography System 885.000 € 6 months no
13. KUMMER
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.7 HMDS Priming and Image Reversal Oven 53.800 € 3 months
14. ACCRETECH (EUROPE) GMBH
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
4.1 Programmable Wafer Tester 99.900 € 10 weeks yes
15. TELSTAR INSTRUMAT, S.L.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
4.2. Contact Profilometer 49.000 € 3 months yes
4.4 Four-Probe Resistivity Mapper 38.500 € 3 months yes
16. AJA INTERNATIONAL, INC.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.7 UHV PVD Deposition System with Magnetrons in Confocal geometry 602.830 $ 22-26
17. DKSH FRANCE, S.A.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.2 Plasma-Enhanced Chemical Vapor Deposition Tool for SIO2 OR SINX 282.500 € 6 months Yes
3.4 Reactive Ion Etching System for SIO2 or SINX 358.750 € 6 months Yes
3.5 Reactive Ion System for AISiCu and TiN 376.850 € 6 months Yes
3.6 Ion Milling System 578.600 € 6 months Yes
3.9 Chemical Vapor Deposition for Carbon Nanotubes and Nanowires 218.430 € 6 months yes
18. CAPRES A/S
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
4.5 Full-Wafer magnetoresistance current in plane tester 198.500 € 4 months no
19. TSE-SYSTEME GMBH
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
SET II Wetbenches and Fume-Hoods 284.250 € 14 weeks No
20. LOT – ORIEL LASER OPTIK TECHNOLOGIE GMBH & CO. KG.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.2 Laser Direct Write Lithography System 265.000 € 6 months Yes
5.1 Vibrating Sample Magnetometer 259.000 € 5 months no
5.2 SQUID (Superconducting Quantum Interference Device) mangnetometry system with closed loop cryogenic dewar 431.070 € 6 months no
21. SCIENTEC S.A.R.L.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
4.2 Contact Profilometer 50.000 € ----- no
22. SUSS MICROTECH LITOGRAPHY GMBH
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.4 Dual Resist and Developer Coating Tracks (optical photoresist) 300.000 € 14 weeks Yes
1.5 Dual Resist and Developer Coating Tracks (e-beam resist, PMMA) 340.000 € 14 weeks Yes
1.7 HMDS Primming and Image Reversal Oven 54.000 € 12 weeks Yes
1.3 UV Mask and Bond Aligner 280.000 € 16 weeks Yes
4.1 Programmable Wafer Tester 77.540 € 8 weeks yes
23. 4WAVE INC.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.6 Ion Milling System 580.000 € 24 weeks no
24. KENOSISTEC SRL
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.7 UHV PVD Deposition System with Magnetrons un Confocal geometry 493.000 € 25 weeks no
25. TFE SRL THIN FILM EQUIPMENT
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.2 Plasma.Enhanced Chemical Vapor Deposition Tool for SIO2 or SINX 395.200 € 21 weeks no
3.4 Reactive Ion Etching System for SIO2 and SINX 445.000 € 21 weeks No
3.5 Reactive Ion Etching System for AISiCu and TiN 428.770 € 21 weeks No
3.8 Deep Si-Etching System 428.770 € 21 weeks No
26. CRESTEC CORPORATION
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.1 E-beam lithography system 1.350.000 € 8 months
27. INNODYS SL
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.9 Chemical Vapor Deposition for Carbon Nanotubes and Nanowires 224.000 € 7 months yes
3.7 UHV PVD Deposition System with Magnetrons in Confocal geometry 652.000 € 9 months yes
28. PARALAB - EQUIPAMENTOS INDUSTRIAIS E DE LABORATORIO, S.A.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
4.2 Contact Profilometer 44.198,25 € 3 months no
29. EVATEC THINFILM TECHONOLOGY GMBH
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.2 Plasma.Enhanced Chemical Vapor Deposition Tool for SIO2 or SINX 399.990 € 3 months Yes
3.3. Physical Vapor Deposition Tool for metallization and passivation 999.990 € 6 months No
3.4 Reactive Ion Etching System for SIO2 and SINX 399.990 € 3 months Yes
3.5 Reactive Ion Etching System for AISiCu and TiN 399.990 € 3 months Yes
30. SURFACE TECHNOLOGY SYSTEMS, PLC.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.2 Plasma.Enhanced Chemical Vapor Deposition Tool for SIO2 or SINX 302.485 € 20 weeks
3.2 Plasma.Enhanced Chemical Vapor Deposition Tool for SIO2 or SINX 274.835 € 20 weeks
3.4 Reactive Ion Etching System for SIO2 and SINX 385.000 € 18-24 weeks
3.5 Reactive Ion Etching System for AISiCu and TiN 275.000 € 18-20 weeks
3.8 Deep Si-Etching System 448.850 € 18-20 weeks
31. 4WAVE INC.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.1 Multi-target physical vapor deposition cluster tool 2.476.875 € 44 weeks no
32. EVGROUP EUROPE AND ASIA/PACIFIC GMBH
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.3 UV Mask and Bond Aligner 280.000 € 3,5 months yes
1.4
1.5 Dual Resist and Developer Coating Tracks (optical photoresist)
Dual Resist and Developer Coating Tracks (e-beam resist, PMMA) 640.000 € 6 months yes
33. JEOL (EUROPE) SAS
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
1.1 E-beam lithography system 1.748.000 € 10 months no
34. DIAS DE SOUSA INSTRUMENTAÇAO ANALÍTICA E CIENTÍFICA, S.A.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
3.1 Multi-target physical vapor deposition cluster tool 2.769.570 € 44 weeks no
3.3 Physical Vapor Deposition Tool for metallizationand passivation 1.155.660 € 34 weeks No
3.7 UHV PVD Deposition System with Magnetrons in Confocal geometry 890.150 € 34 weeks no
35. SMARTIP B.V.
LOT EQUIPMENT AMOUNT DELIVERY TIME WAIVER OF PRICES ON ACCOUNT
4.5 Full-Wafer magnetoresistance current in plane tester 109.650 € 12 weeks
The Selection Committee has decided that all of the foregoing shall be notified to the tenderers by e-mail, and published in the INL contractor profile.
And being no other subjects to discuss, the session now stands adjourned on the date set forth above, signing below the SECRETARY, the PRESIDENT and the VICE-PRESIDENT.
|
|
|
|